Characterisation of Element Distribution in Films and Coatings with RF GD-OES and TOFMS™ Methods
DOI:
https://doi.org/10.15407/scin8.02.034Keywords:
grow discharge plasma, elemental distribution, thin film, surface analysis.Abstract
Methods of optical emission spectrometry of grow HFdis charge are described. The unique characteristics of GD plasma, which allow performing very fast surface erosion, are presented.
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