Vacuum-plasma Module for the Forming of Structure Element Base of Nanoelectronics and Microenergetics
DOI:
https://doi.org/10.15407/scin6.03.036Keywords:
ion-plasma technologies, nano- and microelectronics, plasma capacity HF source, plasma helicon source, vacuum-technological equipmentAbstract
The vacuum-plasma module — specialized technological unit of precision size etching and multifunction ion-plasma treatment is created. It is based on the two-figure system, consisting of high selective plasma-chemical and high anisotropic reactively-ionic etch sources. The module is intended for the forming of structure element base of nanoelectronics and nanodevice topology, thermal emission sources, elements converting sun and thermal energy into electrical energy.
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