Plant for Precision Ionic-plasma Formation of Carbon Nanotubes in the United Vacuum-Technological Cycle
DOI:
https://doi.org/10.15407/scin5.05.005Keywords:
carbon nanotube, helicon source, ionic-plasma technologies, vacuum plant, vacuum-arc sourceAbstract
The plant for ionic-plasma formation carbon nanotubes and other nanostructures is created. The plant contains highvacuumpump system, working gases letting system, helicon discharge chamber, drift chamber, vacuum-arc sources, power sources and monitoring system with a small-sized optical spectrometer. The plant integrates processes plasma-enhanced chemical vapour-phase deposition, plasma clearing and activation of a substrate surface, deposition of transitive adhesive layers and metal-catalyst, direct formation process of carbon nanostructure.
References
Nanotehnologii v jelektronike. Pod red. Ju.A. Chaplygina. Moskva: Tehnosfera, 2005 [in Russian].
Shinohara S., Shamrai K.P. Effect of electrostatic waves on a rf field penetration into highly collisional helicon plasmas. Thin Solid Films. 2002, 407(1-2): 215-220.
https://doi.org/10.1016/S0040-6090(02)00041-X
Kral'kina E.A. Induktivnyj vysokochastotnyj razrjad nizkogo davlenija i vozmozhnosti optimizacii istochnikov plazmy na ego osnove. UFN. 2008, 178(5): 519-540 [in Russian].
